PERSONAL CLEANSING COMPOSITION FREE OF ALKYL SULFATE OR ALKYL ETHER SULFATE TYPE OF SURFACTANTS

A personal cleansing composition includes a surfactant system, where the surfactant system contains from about 0.1% to about 5% of a fatty acyl isethionate surfactant and from about 0.5% to about 40% of a co-surfactant. The composition is free of alkyl sulfate or alkyl ether sulfate type of surfacta...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Zhang, Lesheng, Lu, Ruiqi, Wei, Karl Shiqing, Smith, III, Edward Dewey, Li, Ye
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue
container_start_page
container_title
container_volume
creator Zhang, Lesheng
Lu, Ruiqi
Wei, Karl Shiqing
Smith, III, Edward Dewey
Li, Ye
description A personal cleansing composition includes a surfactant system, where the surfactant system contains from about 0.1% to about 5% of a fatty acyl isethionate surfactant and from about 0.5% to about 40% of a co-surfactant. The composition is free of alkyl sulfate or alkyl ether sulfate type of surfactants. The composition also contains from about 0.05% to about 5% of a of a non-ionic surfactant comprising a fatty alkanolamide, from about 0.01% to about 2.0% of a hydrophobically modified ethoxylated methyl glucoside, and from about 0.01% to about 1.0% of a preservative. The pH of the composition is from about 5.5 to about 7.
format Patent
fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2023329993A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2023329993A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2023329993A13</originalsourceid><addsrcrecordid>eNqNyrEKwjAQgOEuDqK-w4GzoMnU8QgXG4xJyV2HTqGUOIkW6vujSHF2-uHjX1e5pcQxoAfjCQO7cAYTr21kJy4GsIkIogX0l94Dd96ifCAtQNJQ-rH07XfmLlk0gkF4W61uw30uu6Wbam9JTHMo0zOXeRrG8iiv3LE6Kq1VXdcaT_q_6w0yRzRR</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PERSONAL CLEANSING COMPOSITION FREE OF ALKYL SULFATE OR ALKYL ETHER SULFATE TYPE OF SURFACTANTS</title><source>esp@cenet</source><creator>Zhang, Lesheng ; Lu, Ruiqi ; Wei, Karl Shiqing ; Smith, III, Edward Dewey ; Li, Ye</creator><creatorcontrib>Zhang, Lesheng ; Lu, Ruiqi ; Wei, Karl Shiqing ; Smith, III, Edward Dewey ; Li, Ye</creatorcontrib><description>A personal cleansing composition includes a surfactant system, where the surfactant system contains from about 0.1% to about 5% of a fatty acyl isethionate surfactant and from about 0.5% to about 40% of a co-surfactant. The composition is free of alkyl sulfate or alkyl ether sulfate type of surfactants. The composition also contains from about 0.05% to about 5% of a of a non-ionic surfactant comprising a fatty alkanolamide, from about 0.01% to about 2.0% of a hydrophobically modified ethoxylated methyl glucoside, and from about 0.01% to about 1.0% of a preservative. The pH of the composition is from about 5.5 to about 7.</description><language>eng</language><subject>HUMAN NECESSITIES ; HYGIENE ; MEDICAL OR VETERINARY SCIENCE ; PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES ; SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20231019&amp;DB=EPODOC&amp;CC=US&amp;NR=2023329993A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20231019&amp;DB=EPODOC&amp;CC=US&amp;NR=2023329993A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Zhang, Lesheng</creatorcontrib><creatorcontrib>Lu, Ruiqi</creatorcontrib><creatorcontrib>Wei, Karl Shiqing</creatorcontrib><creatorcontrib>Smith, III, Edward Dewey</creatorcontrib><creatorcontrib>Li, Ye</creatorcontrib><title>PERSONAL CLEANSING COMPOSITION FREE OF ALKYL SULFATE OR ALKYL ETHER SULFATE TYPE OF SURFACTANTS</title><description>A personal cleansing composition includes a surfactant system, where the surfactant system contains from about 0.1% to about 5% of a fatty acyl isethionate surfactant and from about 0.5% to about 40% of a co-surfactant. The composition is free of alkyl sulfate or alkyl ether sulfate type of surfactants. The composition also contains from about 0.05% to about 5% of a of a non-ionic surfactant comprising a fatty alkanolamide, from about 0.01% to about 2.0% of a hydrophobically modified ethoxylated methyl glucoside, and from about 0.01% to about 1.0% of a preservative. The pH of the composition is from about 5.5 to about 7.</description><subject>HUMAN NECESSITIES</subject><subject>HYGIENE</subject><subject>MEDICAL OR VETERINARY SCIENCE</subject><subject>PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES</subject><subject>SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNyrEKwjAQgOEuDqK-w4GzoMnU8QgXG4xJyV2HTqGUOIkW6vujSHF2-uHjX1e5pcQxoAfjCQO7cAYTr21kJy4GsIkIogX0l94Dd96ifCAtQNJQ-rH07XfmLlk0gkF4W61uw30uu6Wbam9JTHMo0zOXeRrG8iiv3LE6Kq1VXdcaT_q_6w0yRzRR</recordid><startdate>20231019</startdate><enddate>20231019</enddate><creator>Zhang, Lesheng</creator><creator>Lu, Ruiqi</creator><creator>Wei, Karl Shiqing</creator><creator>Smith, III, Edward Dewey</creator><creator>Li, Ye</creator><scope>EVB</scope></search><sort><creationdate>20231019</creationdate><title>PERSONAL CLEANSING COMPOSITION FREE OF ALKYL SULFATE OR ALKYL ETHER SULFATE TYPE OF SURFACTANTS</title><author>Zhang, Lesheng ; Lu, Ruiqi ; Wei, Karl Shiqing ; Smith, III, Edward Dewey ; Li, Ye</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2023329993A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>HUMAN NECESSITIES</topic><topic>HYGIENE</topic><topic>MEDICAL OR VETERINARY SCIENCE</topic><topic>PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES</topic><topic>SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS</topic><toplevel>online_resources</toplevel><creatorcontrib>Zhang, Lesheng</creatorcontrib><creatorcontrib>Lu, Ruiqi</creatorcontrib><creatorcontrib>Wei, Karl Shiqing</creatorcontrib><creatorcontrib>Smith, III, Edward Dewey</creatorcontrib><creatorcontrib>Li, Ye</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Zhang, Lesheng</au><au>Lu, Ruiqi</au><au>Wei, Karl Shiqing</au><au>Smith, III, Edward Dewey</au><au>Li, Ye</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PERSONAL CLEANSING COMPOSITION FREE OF ALKYL SULFATE OR ALKYL ETHER SULFATE TYPE OF SURFACTANTS</title><date>2023-10-19</date><risdate>2023</risdate><abstract>A personal cleansing composition includes a surfactant system, where the surfactant system contains from about 0.1% to about 5% of a fatty acyl isethionate surfactant and from about 0.5% to about 40% of a co-surfactant. The composition is free of alkyl sulfate or alkyl ether sulfate type of surfactants. The composition also contains from about 0.05% to about 5% of a of a non-ionic surfactant comprising a fatty alkanolamide, from about 0.01% to about 2.0% of a hydrophobically modified ethoxylated methyl glucoside, and from about 0.01% to about 1.0% of a preservative. The pH of the composition is from about 5.5 to about 7.</abstract><oa>free_for_read</oa></addata></record>
fulltext fulltext_linktorsrc
identifier
ispartof
issn
language eng
recordid cdi_epo_espacenet_US2023329993A1
source esp@cenet
subjects HUMAN NECESSITIES
HYGIENE
MEDICAL OR VETERINARY SCIENCE
PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES
SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS
title PERSONAL CLEANSING COMPOSITION FREE OF ALKYL SULFATE OR ALKYL ETHER SULFATE TYPE OF SURFACTANTS
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-02T13%3A47%3A51IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Zhang,%20Lesheng&rft.date=2023-10-19&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS2023329993A1%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true