PERSONAL CLEANSING COMPOSITION FREE OF ALKYL SULFATE OR ALKYL ETHER SULFATE TYPE OF SURFACTANTS

PERSONAL CLEANSING COMPOSITION FREE OF ALKYL SULFATE OR ALKYL ETHER SULFATE TYPE OF SURFACTANTS

A personal cleansing composition includes a surfactant system, where the surfactant system contains from about 0.1% to about 5% of a fatty acyl isethionate surfactant and from about 0.5% to about 40% of a co-surfactant. The composition is free of alkyl sulfate or alkyl ether sulfate type of surfacta...

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Bibliographische Detailangaben
Hauptverfasser: Zhang, Lesheng, Lu, Ruiqi, Wei, Karl Shiqing, Smith, III, Edward Dewey, Li, Ye
Format: Patent
Sprache:eng
Schlagworte:
HUMAN NECESSITIES
HYGIENE
MEDICAL OR VETERINARY SCIENCE
PREPARATIONS FOR MEDICAL, DENTAL, OR TOILET PURPOSES
SPECIFIC USE OF COSMETICS OR SIMILAR TOILETPREPARATIONS
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Zusammenfassung:A personal cleansing composition includes a surfactant system, where the surfactant system contains from about 0.1% to about 5% of a fatty acyl isethionate surfactant and from about 0.5% to about 40% of a co-surfactant. The composition is free of alkyl sulfate or alkyl ether sulfate type of surfactants. The composition also contains from about 0.05% to about 5% of a of a non-ionic surfactant comprising a fatty alkanolamide, from about 0.01% to about 2.0% of a hydrophobically modified ethoxylated methyl glucoside, and from about 0.01% to about 1.0% of a preservative. The pH of the composition is from about 5.5 to about 7.