PROCESSING APPARATUS AND METHOD OF MANUFACTURE

PROCESSING APPARATUS AND METHOD OF MANUFACTURE

An ion beam processing tool includes a plasma source, a grid arrangement positioned proximate the plasma source to generate an ion beam, a beam deflector positioned adjacent the grid arrangement, and a controller configured to control the beam deflector to deflect the ion beam to generate a tilted i...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: YANG, Chansyun David
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:An ion beam processing tool includes a plasma source, a grid arrangement positioned proximate the plasma source to generate an ion beam, a beam deflector positioned adjacent the grid arrangement, and a controller configured to control the beam deflector to deflect the ion beam to generate a tilted ion beam. A method includes generating an ion beam, directing the ion beam at a target, deflecting the ion beam in a first direction to remove a first portion of material from the target, and deflecting the ion beam in a second direction different than the first direction to remove a second portion of material from the target.