METHOD FOR PERFORMING TOPOGRAPHIC MEASUREMENT AND TOPOGRAPHIC MEASURING MACHINE

A topographic measurement method includes provision of a sample including first surface provided with plurality of salient patterns. The first surface of the sample is illuminated by means of structured light that defines several repetitive patterns. The structured light is emitted at first angle wi...

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Bibliographische Detailangaben
Hauptverfasser: BRAISAZ, Régis, VERNHES, Pierre
Format: Patent
Sprache:eng
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Zusammenfassung:A topographic measurement method includes provision of a sample including first surface provided with plurality of salient patterns. The first surface of the sample is illuminated by means of structured light that defines several repetitive patterns. The structured light is emitted at first angle with respect to first surface. A first image of first surface of sample illuminated by structured light is acquired. The first image is acquired at second angle with respect to first surface. A second image of illuminated sample is acquired. The second image differs from first image by value of exposure time. The first image is compared with second image to determine presence of at least one artefact on the first image. A reference image is formed from the first image and the second image. The reference image is devoid of any artefact. A quantity representative of the first surface is calculated from the reference image.