METAL-SILICIDE-NITRIDATION FOR STRESS REDUCTION

A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pell...

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Bibliographische Detailangaben
Hauptverfasser:	KLOOTWIJK, Johan Hendrik, SJMAENOK, Leonid Aizikovitsj, VAN DER WOORD, Ties Wouter, NOTENBOOM, Arnoud Willem, NASALEVICH, Maxim Aleksandrovich, PÉTER, Mária, VLES, David Ferdinand, VAN ZWOL, Pieter-Jan, GIESBERS, Adrianus Johannes Maria, KURGANOVA, Evgenia
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A pellicle for a lithographic apparatus, the pellicle including nitridated metal silicide or nitridated silicon as well as a method of manufacturing the same. Also disclosed is the use of a nitridated metal silicide or nitridated silicon pellicle in a lithographic apparatus. Also disclosed is a pellicle for a lithographic apparatus including at least one compensating layer selected and configured to counteract changes in transmissivity of the pellicle upon exposure to EUV radiation as well as a method of controlling the transmissivity of a pellicle and a method of designing a pellicle.