DISPLAY DEVICE AND MANUFACTURING METHOD OF DISPLAY DEVICE

According to one embodiment, in a manufacturing method of a display device, a first etching stopper layer and a first sealing layer is formed. A second etching stopper layer and a second sealing layer is formed. A third etching stopper layer and a third sealing layer is formed. An etching rate of th...

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Bibliographische Detailangaben
Hauptverfasser: FUKUDA, Kaichi, TAKAYAMA, Masaru, TAKENAKA, Takanobu, MIZUKOSHI, Hirofumi
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:According to one embodiment, in a manufacturing method of a display device, a first etching stopper layer and a first sealing layer is formed. A second etching stopper layer and a second sealing layer is formed. A third etching stopper layer and a third sealing layer is formed. An etching rate of the first etching stopper layer is less than an etching rate of the first sealing layer. An etching rate of the second etching stopper layer is less than an etching rate of the second sealing layer. An etching rate of the third etching stopper layer is less than an etching rate of the third sealing layer. A thickness of each of the first etching stopper layer and the second etching stopper layer is greater than a thickness of the third etching stopper layer.