SEMICONDUCTOR DEVICES

A semiconductor device includes a channel on a substrate, the channel including a two-dimensional (2D) material, a gate insulating layer on a portion of the channel, a gate electrode on the gate insulating layer, first and second contact patterns on respective portions of the channel, the first and...

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Bibliographische Detailangaben
Hauptverfasser: KOO, Jiwan, CHOI, Jaewoong, KUH, Bongjin, HONG, Sahwan, SEO, Seunghwan, AHN, Hogeun, PARK, Jinhong, KANG, Juncheol
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A semiconductor device includes a channel on a substrate, the channel including a two-dimensional (2D) material, a gate insulating layer on a portion of the channel, a gate electrode on the gate insulating layer, first and second contact patterns on respective portions of the channel, the first and second contact patterns including a carbide of a transition metal, and first and second source/drain electrodes on the first and second contact patterns, respectively, and the first and second source/drain electrodes including a metal.