NOZZLE HAVING DOUBLE PIPE STRUCTURE, AND PHOTORESIST DISPENSER AND SPIN COATER, EACH INCLUDING THE NOZZLE

Provided are a nozzle having a double pipe structure in which multi-suck-back is possible without driving a nozzle arm, and also, a reduced resist consumption (RRC) operation and a nozzle tip rinsing operation are possible without moving the nozzle arm, and a photoresist (PR) dispenser and a spin co...

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Bibliographische Detailangaben
Hauptverfasser:	Son, Youngjun, Choi, Byoungdoo
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Provided are a nozzle having a double pipe structure in which multi-suck-back is possible without driving a nozzle arm, and also, a reduced resist consumption (RRC) operation and a nozzle tip rinsing operation are possible without moving the nozzle arm, and a photoresist (PR) dispenser and a spin coater, each including the nozzle. The nozzle includes an inner pipe having a conical shape gradually narrowing downward, through which PR is transferred, and having a tip through which the PR is ejected, and an outer pipe surrounding the inner pipe, having a conical shape gradually narrowing downward, through which thinner is transferred, and having a tip through which the thinner is ejected, wherein the nozzle is coupled to a nozzle arm and moved, and multi-suck-back is performed without driving the nozzle arm.