Processing System and Charged Particle Beam Apparatus

A processing system and a charged particle beam apparatus for the purpose of determining the degree of growth or the presence or absence of a defect in an epitaxial layer grown in a groove or a hole such as between inner spacers from an image of the groove or the hole are proposed. In a processing s...

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Bibliographische Detailangaben
Hauptverfasser:	GOTO, Masaya, KAKUTA, Junichi, SAKAI, Kei, YAMAGUCHI, Satoru
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS TESTING
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Beschreibung
Zusammenfassung:	A processing system and a charged particle beam apparatus for the purpose of determining the degree of growth or the presence or absence of a defect in an epitaxial layer grown in a groove or a hole such as between inner spacers from an image of the groove or the hole are proposed. In a processing system including a computer system, the computer system calculates a distance and a brightness value related to a layer between a plurality of structures from a signal profile in accordance with one direction on a two-dimensional plane related to the layer, which is obtained by irradiating the layer with an electron beam, and determines or outputs a state of the layer based on the distance and the brightness value.