EUV LIGHT SOURCE TARGET METROLOGY

Disclosed is an apparatus for and method of aligning a target composed of a target material and a conditioning beam provided to condition the target by changing the target's shape, mass distribution, etc., in which the conditioning beam includes structured light in the form of an inhomogeneous...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	Rafac, Robert Jay
Format:	Patent
Sprache:	eng
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY X-RAY TECHNIQUE
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