EUV LIGHT SOURCE TARGET METROLOGY

Disclosed is an apparatus for and method of aligning a target composed of a target material and a conditioning beam provided to condition the target by changing the target's shape, mass distribution, etc., in which the conditioning beam includes structured light in the form of an inhomogeneous...

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Bibliographische Detailangaben
1. Verfasser:	Rafac, Robert Jay
Format:	Patent
Sprache:	eng
Schlagworte:	ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY X-RAY TECHNIQUE
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	Disclosed is an apparatus for and method of aligning a target composed of a target material and a conditioning beam provided to condition the target by changing the target's shape, mass distribution, etc., in which the conditioning beam includes structured light in the form of an inhomogeneous distribution of a propagation mode such as a polarization mode across a spatial mode of the target.