SUBSTRATE PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS

A development device has a plurality of nozzles and a plurality of pipes. The plurality of nozzles supply a processing liquid to a substrate. Each of the plurality of pipes is connected to one of the plurality of nozzles and supplies a processing liquid to a nozzle to which the pipe is connected. Th...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: KOMORI, Jun
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:A development device has a plurality of nozzles and a plurality of pipes. The plurality of nozzles supply a processing liquid to a substrate. Each of the plurality of pipes is connected to one of the plurality of nozzles and supplies a processing liquid to a nozzle to which the pipe is connected. The development device includes a support and a cover member. The support supports portions of the plurality of pipes. The cover member contains part of the plurality of nozzles and the plurality of pipes while allowing supply of the processing liquid to substrates from the plurality of nozzles. When the support moves or rotates, the plurality of nozzles move between a processing position and a waiting position.