ELECTROCHROMIC DEVICE AND MANUFACTURING METHOD THEREOF

Provided is a method for manufacturing an electrochromic device, the method including forming a first electrode on a first flexible substrate, forming an electrochromic layer on the first electrode, etching the electrochromic layer to form electrochromic pixel patterns, etching the first electrode to form fine pattern electrodes including first fine pattern electrode portions and second fine pattern electrode portions, forming an insulation film on upper surfaces of the second fine pattern electrode portions, and forming an electrolyte layer on the insulation film and on the electrochromic pixel patterns, wherein the electrochromic pixel patterns are disposed on upper surface of the first fine pattern electrode portions, and the etching of the first electrode and the etching of the electrochromic layer are performed in a single process.