SUBSTRATE PROCESSING APPARATUS

A development device includes a casing, an airflow former and a substrate holding device. The airflow former forms a downward flow of clean air in the inner space of the casing. The development device further includes a plurality of nozzles and a partition mechanism. The plurality of nozzles supply...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser:	KOMORI, Jun
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL PERFORMING OPERATIONS SPRAYING OR ATOMISING IN GENERAL TRANSPORTING
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Beschreibung
Zusammenfassung:	A development device includes a casing, an airflow former and a substrate holding device. The airflow former forms a downward flow of clean air in the inner space of the casing. The development device further includes a plurality of nozzles and a partition mechanism. The plurality of nozzles supply a processing liquid to a substrate held by the substrate holding device. The partition mechanism partitions the inner space of the casing into a processing space and a non-processing space with a substrate held by the substrate holding device. The processing space is a space including a substrate held by the substrate holding device. The partition mechanism includes a cup that receives a processing liquid that splashes from a substrate, a partition plate that has a nozzle opening and a plurality of through holes and is provided above the cup and a cover member that covers the nozzle opening.