LITHOGRAPHIC APPARATUS AND METHOD
A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.
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| creator | Laurent, Thibault Simon Mathieu Kunnen, Johan Gertrudis Cornelis Ottens, Joost Jeroen Jacobs, Johannes Henricus Wilhelmus Knarren, Bastiaan Andreas Wilhelmus Hubertus Remie, Marinus Jan Voogd, Robbert Jan TEN KATE, NICOLAAS Nino, Giovanni Francisco |
| description | A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US2023273533A1</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US2023273533A1</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US2023273533A13</originalsourceid><addsrcrecordid>eNrjZFD08Qzx8HcPcgzw8HRWcAwIcAxyDAkNVnD0c1HwdQVKufAwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUkvjQYCMDI2Mjc2NTY2NHQ2PiVAEAoyQjGw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>LITHOGRAPHIC APPARATUS AND METHOD</title><source>esp@cenet</source><creator>Laurent, Thibault Simon Mathieu ; Kunnen, Johan Gertrudis Cornelis ; Ottens, Joost Jeroen ; Jacobs, Johannes Henricus Wilhelmus ; Knarren, Bastiaan Andreas Wilhelmus Hubertus ; Remie, Marinus Jan ; Voogd, Robbert Jan ; TEN KATE, NICOLAAS ; Nino, Giovanni Francisco</creator><creatorcontrib>Laurent, Thibault Simon Mathieu ; Kunnen, Johan Gertrudis Cornelis ; Ottens, Joost Jeroen ; Jacobs, Johannes Henricus Wilhelmus ; Knarren, Bastiaan Andreas Wilhelmus Hubertus ; Remie, Marinus Jan ; Voogd, Robbert Jan ; TEN KATE, NICOLAAS ; Nino, Giovanni Francisco</creatorcontrib><description>A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230831&DB=EPODOC&CC=US&NR=2023273533A1$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25568,76551</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230831&DB=EPODOC&CC=US&NR=2023273533A1$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Laurent, Thibault Simon Mathieu</creatorcontrib><creatorcontrib>Kunnen, Johan Gertrudis Cornelis</creatorcontrib><creatorcontrib>Ottens, Joost Jeroen</creatorcontrib><creatorcontrib>Jacobs, Johannes Henricus Wilhelmus</creatorcontrib><creatorcontrib>Knarren, Bastiaan Andreas Wilhelmus Hubertus</creatorcontrib><creatorcontrib>Remie, Marinus Jan</creatorcontrib><creatorcontrib>Voogd, Robbert Jan</creatorcontrib><creatorcontrib>TEN KATE, NICOLAAS</creatorcontrib><creatorcontrib>Nino, Giovanni Francisco</creatorcontrib><title>LITHOGRAPHIC APPARATUS AND METHOD</title><description>A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZFD08Qzx8HcPcgzw8HRWcAwIcAxyDAkNVnD0c1HwdQVKufAwsKYl5hSn8kJpbgZlN9cQZw_d1IL8-NTigsTk1LzUkvjQYCMDI2Mjc2NTY2NHQ2PiVAEAoyQjGw</recordid><startdate>20230831</startdate><enddate>20230831</enddate><creator>Laurent, Thibault Simon Mathieu</creator><creator>Kunnen, Johan Gertrudis Cornelis</creator><creator>Ottens, Joost Jeroen</creator><creator>Jacobs, Johannes Henricus Wilhelmus</creator><creator>Knarren, Bastiaan Andreas Wilhelmus Hubertus</creator><creator>Remie, Marinus Jan</creator><creator>Voogd, Robbert Jan</creator><creator>TEN KATE, NICOLAAS</creator><creator>Nino, Giovanni Francisco</creator><scope>EVB</scope></search><sort><creationdate>20230831</creationdate><title>LITHOGRAPHIC APPARATUS AND METHOD</title><author>Laurent, Thibault Simon Mathieu ; Kunnen, Johan Gertrudis Cornelis ; Ottens, Joost Jeroen ; Jacobs, Johannes Henricus Wilhelmus ; Knarren, Bastiaan Andreas Wilhelmus Hubertus ; Remie, Marinus Jan ; Voogd, Robbert Jan ; TEN KATE, NICOLAAS ; Nino, Giovanni Francisco</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2023273533A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>Laurent, Thibault Simon Mathieu</creatorcontrib><creatorcontrib>Kunnen, Johan Gertrudis Cornelis</creatorcontrib><creatorcontrib>Ottens, Joost Jeroen</creatorcontrib><creatorcontrib>Jacobs, Johannes Henricus Wilhelmus</creatorcontrib><creatorcontrib>Knarren, Bastiaan Andreas Wilhelmus Hubertus</creatorcontrib><creatorcontrib>Remie, Marinus Jan</creatorcontrib><creatorcontrib>Voogd, Robbert Jan</creatorcontrib><creatorcontrib>TEN KATE, NICOLAAS</creatorcontrib><creatorcontrib>Nino, Giovanni Francisco</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Laurent, Thibault Simon Mathieu</au><au>Kunnen, Johan Gertrudis Cornelis</au><au>Ottens, Joost Jeroen</au><au>Jacobs, Johannes Henricus Wilhelmus</au><au>Knarren, Bastiaan Andreas Wilhelmus Hubertus</au><au>Remie, Marinus Jan</au><au>Voogd, Robbert Jan</au><au>TEN KATE, NICOLAAS</au><au>Nino, Giovanni Francisco</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>LITHOGRAPHIC APPARATUS AND METHOD</title><date>2023-08-31</date><risdate>2023</risdate><abstract>A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | LITHOGRAPHIC APPARATUS AND METHOD |
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