LITHOGRAPHIC APPARATUS AND METHOD

A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.

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Bibliographische Detailangaben
Hauptverfasser:	Laurent, Thibault Simon Mathieu, Kunnen, Johan Gertrudis Cornelis, Ottens, Joost Jeroen, Jacobs, Johannes Henricus Wilhelmus, Knarren, Bastiaan Andreas Wilhelmus Hubertus, Remie, Marinus Jan, Voogd, Robbert Jan, TEN KATE, NICOLAAS, Nino, Giovanni Francisco
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A lithographic apparatus is disclosed that includes a substrate table configured to support a substrate on a substrate supporting area and a heater and/or temperature sensor on a surface adjacent the substrate supporting area.