LOW REFLECTIVITY PHOTOSENSITIVE RESIN COMPOSITION AND LIGHT-SHIELDING LAYER USING SAME

LOW REFLECTIVITY PHOTOSENSITIVE RESIN COMPOSITION AND LIGHT-SHIELDING LAYER USING SAME

According to one embodiment of the present disclosure, a photosensitive resin composition comprising a resin containing a repeating unit represented by Chemical Formula (1), a dye represented by Chemical Formula (2), a reactive unsaturated compound, a pigment, an initiator, and a solvent, and a disp...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LEE, Changmin, KIM, Jun Ki, BAE, Jun, CHO, Hyunsang, MUN, Soung Yun, KO, Yun Jong
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:According to one embodiment of the present disclosure, a photosensitive resin composition comprising a resin containing a repeating unit represented by Chemical Formula (1), a dye represented by Chemical Formula (2), a reactive unsaturated compound, a pigment, an initiator, and a solvent, and a display device comprising a pattern layer containing a polymerization reaction product of the photosensitive resin composition are provided.