ANTIREFLECTIVE MEMBER, AND POLARIZING PLATE, IMAGE DISPLAY DEVICE, AND ANTIREFLECTIVE ARTICLE IN WHICH SAID ANTIREFLECTIVE MEMBER IS USED, AS WELL AS METHOD FOR SELECTING ANTIREFLECTIVE MEMBER

ANTIREFLECTIVE MEMBER, AND POLARIZING PLATE, IMAGE DISPLAY DEVICE, AND ANTIREFLECTIVE ARTICLE IN WHICH SAID ANTIREFLECTIVE MEMBER IS USED, AS WELL AS METHOD FOR SELECTING ANTIREFLECTIVE MEMBER

Provided is an antireflective member capable of improving scratch resistance. An antireflective member having a low refractive index layer on an optically transmissive substrate, the low refractive index layer containing a binder resin and hollow particles, wherein the antireflective member satisfie...

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Bibliographische Detailangaben
Hauptverfasser: MATSUDA, Yoshinari, KAWAKITA, Noriaki, HORII, Atsushi, ENDOU, Keisuke, SUZUKI, Sho
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FREQUENCY-CHANGING
NON-LINEAR OPTICS
OPTICAL ANALOGUE/DIGITAL CONVERTERS
OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
OPTICAL LOGIC ELEMENTS
OPTICS
PHYSICS
SEMICONDUCTOR DEVICES
TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Zusammenfassung:Provided is an antireflective member capable of improving scratch resistance. An antireflective member having a low refractive index layer on an optically transmissive substrate, the low refractive index layer containing a binder resin and hollow particles, wherein the antireflective member satisfies the following condition 1. In a region of 5 μm×5 μm on a surface of the antireflective member on a side having the low refractive index layer with respect to the optically transmissive substrate, spatial frequency analysis of elevation is performed to calculate power spectrum intensity of elevation for each wavelength; when a sum of power spectrum intensity of elevation for each wavelength is calculated and the sum is normalized to 1, the power spectrum intensity P1 of elevation at a wavelength of 1.25 μm is 0.015 or more.