MEMORY DEVICE

A memory cell includes a transistor and a capacitor. The transistor includes a gate electrode, a gate dielectric disposed over the gate electrode, a channel feature disposed over the gate dielectric and overlapping the gate electrode, a source electrode disposed over the channel feature and electric...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: LIOU, Peng-Chun, HUANG, Chia-En, CHENG, Ya-Yun
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A memory cell includes a transistor and a capacitor. The transistor includes a gate electrode, a gate dielectric disposed over the gate electrode, a channel feature disposed over the gate dielectric and overlapping the gate electrode, a source electrode disposed over the channel feature and electrically connected to the capacitor, and two drain electrodes disposed over the channel feature. The drain electrodes are disposed at opposite sides of the source electrode. The channel feature has a first channel portion extending between and interconnecting one drain electrode and the source electrode, and a second channel portion extending between and interconnecting the other drain electrode and the source electrode. The gate electrode overlaps both of the first channel portion and the second channel portion of the channel feature.