INTERFEROMETRIC MEASURING DEVICE

A method of measuring a surface of an optical element and an interferometric measuring device for measuring a surface or profile of the optical element. The optical element having a first surface and a second surface opposite the first surface. The method includes defining at least a first measureme...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: May, Thilo, Am Weg, Christian
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of measuring a surface of an optical element and an interferometric measuring device for measuring a surface or profile of the optical element. The optical element having a first surface and a second surface opposite the first surface. The method includes defining at least a first measurement point, a second measurement point and a third measurement point on a measurement surface of the optical element being one of the first surface and the second surface, measuring a first position of the first measurement point by directing a measurement beam from a measurement head onto the first measurement point and by detecting a measurement beam portion reflected at the first measurement point, subsequently measuring at least a second position of the second measurement point and a third position of the third measurement point by directing the measurement beam onto the second measurement point and onto the third measurement point and by detecting a measurement beam portion reflected at the second measurement point and the third measurement point, respectively, and determining at least one of a decenter and a tilt of the measurement surface relative to a reference axis on the basis of at least the first position, the second position and the third position.