GAS DOSING APPARATUS WITH DIRECTIONAL CONTROL VALVE
A gas dosing apparatus is provided that includes an inlet configured to receive gas, and a directional control valve connected to the inlet and having a first position and a second position. The gas dosing apparatus also includes a fixed volume reservoir connected to the directional control valve an...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A gas dosing apparatus is provided that includes an inlet configured to receive gas, and a directional control valve connected to the inlet and having a first position and a second position. The gas dosing apparatus also includes a fixed volume reservoir connected to the directional control valve and receiving gas from the inlet, via the directional control valve, while the directional control valve is in the first position. The gas dosing apparatus further includes an outlet connected to the directional control valve and outputting a gas dose received from the fixed volume reservoir, via the directional control valve, while the directional control valve is in the second position |
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