DUTY CYCLE CONTROL TO ACHIEVE UNIFORMITY

A method for achieving a first uniformity level in a processing rate across a surface of a substrate is described. The method includes receiving the first uniformity level to be achieved across the surface of the substrate and identifying a first plurality of duty cycles associated with a first plur...

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Bibliographische Detailangaben
Hauptverfasser: Bhowmick, Ranadeep, Holland, John P, Marakhtanov, Alexei M, Kozakevich, Felix Leib, Ji, Bing
Format: Patent
Sprache:eng
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Zusammenfassung:A method for achieving a first uniformity level in a processing rate across a surface of a substrate is described. The method includes receiving the first uniformity level to be achieved across the surface of the substrate and identifying a first plurality of duty cycles associated with a first plurality of states based on the first uniformity level. The first plurality of states are of a variable of a first radio frequency (RF) signal. The method further includes controlling an RF generator to generate the first RF signal having the first plurality of duty cycles.