BLANK MASK AND PHOTOMASK USING THE SAME

BLANK MASK AND PHOTOMASK USING THE SAME

A blank mask includes a transparent substrate and a light shielding film disposed on the transparent substrate. A surface of the light shielding film has a controlled power spectrum density value at a spatial frequency of 1 μm−1 to 10 μm−1. The surface of the light shielding film has a controlled mi...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: KIM, Taewan, KIM, Seong Yoon, LEE, GeonGon, SHIN, INKYUN, CHOI, Suk Young, LEE, Hyung-joo, SON, SUNG HOON, JEONG, Min Gyo
Format: Patent
Sprache:eng
Schlagworte:
APPARATUS SPECIALLY ADAPTED THEREFOR
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:A blank mask includes a transparent substrate and a light shielding film disposed on the transparent substrate. A surface of the light shielding film has a controlled power spectrum density value at a spatial frequency of 1 μm−1 to 10 μm−1. The surface of the light shielding film has a controlled minimum power spectrum density value at the spatial frequency of 1 μm−1 to 10 μm−1. An Rq value of the surface of the light shielding film is 0.25 nm to 0.55 nm.