PLANARIZATION PROCESS, APPARATUS AND METHOD OF MANUFACTURING AN ARTICLE
A planarization system is provided. The planarization system includes a first substrate chuck which holds the substrate during a planarization step, and a second substrate chuck which holds the substrate with a non-flat configuration during a separation step.
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | A planarization system is provided. The planarization system includes a first substrate chuck which holds the substrate during a planarization step, and a second substrate chuck which holds the substrate with a non-flat configuration during a separation step. |
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