SUBSTRATE PROCESSING APPARATUS, HARMONIC CONTROL UNIT AND HARMONIC CONTROL METHOD

Disclosed is a substrate processing apparatus. The substrate processing apparatus includes a chamber having an inner space; a support unit that supports a substrate in the inner space; a ring unit disposed on an edge area of the support unit when viewed from above; a power unit that generates RF pow...

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Bibliographische Detailangaben
Hauptverfasser:	GU, Ja Myung, KIM, Hyung Joon, NA, Sae Won
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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Beschreibung
Zusammenfassung:	Disclosed is a substrate processing apparatus. The substrate processing apparatus includes a chamber having an inner space; a support unit that supports a substrate in the inner space; a ring unit disposed on an edge area of the support unit when viewed from above; a power unit that generates RF power for forming an electric field in the inner space; and a harmonic control unit connected to the ring unit to control harmonics generated by the RF power.