SEMICONDUCTOR MANUFACTURING FACILITY AND TEACHING METHOD OF SEMICONDUCTOR MANUFACTURING FACILITY
Disclosed are a semiconductor manufacturing facility and a teaching method of the semiconductor manufacturing facility, which prevent partial whitening of image information for obtaining a teaching reference point of a teaching target during a teaching operation of a transfer device that transfers a...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | Disclosed are a semiconductor manufacturing facility and a teaching method of the semiconductor manufacturing facility, which prevent partial whitening of image information for obtaining a teaching reference point of a teaching target during a teaching operation of a transfer device that transfers a wafer or a mask, thereby improving readability. The semiconductor manufacturing facility includes: a teaching target in which a first teaching reference point and a second teaching reference point are formed; a transfer device on which the teaching target is mounted; and a teaching inspection unit for image-analyzing the first teaching reference point and the second teaching reference point of the teaching target, calculating center coordinates of each of the first teaching reference point and the second teaching reference point, and teaching the transfer device with an angle value of a line connecting the respective center coordinates. |
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