1 MEV TO 3 MEV DEUTERON/PROTON CYCLOTRON FOR MATERIAL ANALYSIS

Systems and methods related to the use of a proton/deuteron cyclotron for materials analysis and other industrial applications are provided. The methods, apparatuses and uses include positioning a target material for irradiation on a sample holder, focusing a hydrogen ion beam or a deuteron ion beam...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Butalag, Karim, Suthanthiran, Krishnan, Johnson, Richard
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Systems and methods related to the use of a proton/deuteron cyclotron for materials analysis and other industrial applications are provided. The methods, apparatuses and uses include positioning a target material for irradiation on a sample holder, focusing a hydrogen ion beam or a deuteron ion beam, such as a negative hydrogen ion or negative deuteron ion beam, from the cyclotron to the target material, irradiating the target material to induce a (d,*) or a (p,*) reaction thereby producing a radiation emission, and detecting the radiation emission using a detector, wherein the particle beam produced by the cyclotron has an energy in a range of from and including 1 MeV to 3 MeV and has a beam current in a range of from and including 5 pA to 100 nA.