APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

Disclosed is an apparatus for treating a substrate. The apparatus for treating the substrate includes a liquid treating chamber for liquid-treating the substrate by supplying a treatment liquid to the substrate, a drying chamber for drying the substrate by supplying a process fluid to the substrate,...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Choi, Yong Hyun, Lee, Young Hun, Jung, Jin Woo, Choi, Tae Jong, Lee, Sang Min, Im, Yong Joon, Oh, Seung Hoon, Ko, Yong Sun
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS BLASTING CHAMBERS PROVIDED WITH MANIPULATION DEVICES CLEANING CLEANING IN GENERAL DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY HAND TOOLS HEATING LIGHTING MANIPULATORS MECHANICAL ENGINEERING PERFORMING OPERATIONS PORTABLE POWER-DRIVEN TOOLS PREVENTION OF FOULING IN GENERAL SEMICONDUCTOR DEVICES TRANSPORTING WEAPONS
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Beschreibung
Zusammenfassung:	Disclosed is an apparatus for treating a substrate. The apparatus for treating the substrate includes a liquid treating chamber for liquid-treating the substrate by supplying a treatment liquid to the substrate, a drying chamber for drying the substrate by supplying a process fluid to the substrate, a transfer unit for transferring the substrate between the liquid treating chamber and the drying chamber, and a rear surface cleaning unit for cleaning a rear surface of the substrate, in which the rear surface cleaning unit may clean the rear surface of the substrate while transferring the substrate from the liquid treating chamber to the drying chamber.