NOVEL 3D NAND MEMORY DEVICE AND METHOD OF FORMING THE SAME

NOVEL 3D NAND MEMORY DEVICE AND METHOD OF FORMING THE SAME

A semiconductor device includes a first substrate, a second substrate, a first connection structure, and a second connection structure. A transistor is formed in a first side of the first substrate. A doped region is formed in a first side of the second substrate. The first connection structure is f...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: OH, Jin Yong, KIM, Youn Cheul
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:A semiconductor device includes a first substrate, a second substrate, a first connection structure, and a second connection structure. A transistor is formed in a first side of the first substrate. A doped region is formed in a first side of the second substrate. The first connection structure is formed over a second side of the second substrate, and coupled to the doped region through a first VIA that extends from the second side of the second substrate to the doped region. The second connection structure is formed over the first side of the first substrate, connected with the first connection structure via a through silicon VIA, and coupled to the transistor through a bonding VIA. The first substrate is bonded to the second substrate by the bonding VIA, with the first side of the first substrate and the first side of the second substrate being facing each other.