SUBSTRATE TREATING APPARATUS AND METHOD THEREOF

Provided are a substrate treating apparatus and a method thereof that can improve pattern roughness when an etching process is performed for a substrate. The substrate treating method comprises: inserting a substrate into a substrate treating apparatus; injecting a first process gas into the substra...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	JANG, Woo Seok, CHOI, Min Jung, YOU, Ban Seok, TAK, Ki Duk
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY
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