SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

SYMMETRIC VHF SOURCE FOR A PLASMA REACTOR

The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.

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Bibliographische Detailangaben
Hauptverfasser: Markovsky, Igor, Collins, Kenneth S, Misra, Nipun, Chen, Zhigang, Dorf, Leonid, Ramaswamy, Kartik, Carducci, James D, Ye, Zheng John, Rauf, Shahid
Format: Patent
Sprache:eng
Schlagworte:
BASIC ELECTRIC ELEMENTS
ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
ELECTRICITY
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Beschreibung
Zusammenfassung:The disclosure pertains to a capacitively coupled plasma source in which VHF power is applied through an impedance-matching coaxial resonator having a symmetrical power distribution.