APPARATUS AND METHOD FOR DIAGNOSING SEMICONDUCTOR EQUIPMENT

The present invention provides an apparatus and method for diagnosing semiconductor equipment for analyzing a determination result and a cause of a defect for a substrate using a deep learning algorithm and explainable AI. The semiconductor equipment diagnosis method comprises acquiring time series data for a parameter related to a substrate treating process of a substrate treating apparatus, generating table information based on the time series data, converting the table information into image information based on data included in the table information, extracting and classifying a feature from the image information, determining whether a substrate treated by the substrate treating apparatus is good or defective based on the feature, and analyzing a cause of a defect of the substrate in response to determining that the substrate is defective.