SEMICONDUCTOR DEVICE

A first principal electrode and a first control electrode pad are formed on a first principal surface of the semiconductor chip. A second principal electrode and a second control electrode pad are formed on a second principal surface of the semiconductor chip. The second principal electrode and the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: TANAKA, Koji, TSUKUDA, Masanori, NISHI, Koichi, SONEDA, Shinya, SAKAI, Norikazu, SHIKANO, Taketoshi
Format: Patent
Sprache:eng
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Zusammenfassung:A first principal electrode and a first control electrode pad are formed on a first principal surface of the semiconductor chip. A second principal electrode and a second control electrode pad are formed on a second principal surface of the semiconductor chip. The second principal electrode and the second control electrode pad are respectively bonded to first and second metal patterns of an insulating substrate. Bonding sections of first and second wires overlap a bonding section of the second principal electrode or the second control electrode pad in plan view. Thickness of the first and second metal patterns is 0.2 mm or less.