EUV LIGHT GENERATION APPARATUS, ELECTRONIC DEVICE MANUFACTURING METHOD, AND INSPECTION METHOD

An EUV light generation apparatus to generate EUV light by irradiating a target with pulse laser light to turn the target into plasma includes a chamber, a target supply unit configured to supply the target to a plasma generation region in the chamber, a pulse laser device configured to generate pul...

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Bibliographische Detailangaben
Hauptverfasser: SHIRAISHI, Yutaka, IWAMOTO, Fumio
Format: Patent
Sprache:eng
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Zusammenfassung:An EUV light generation apparatus to generate EUV light by irradiating a target with pulse laser light to turn the target into plasma includes a chamber, a target supply unit configured to supply the target to a plasma generation region in the chamber, a pulse laser device configured to generate pulse laser light to be radiated to the target, and a processor configured to change a generation frequency of the target generated by the target supply unit to a natural number multiple of an irradiation frequency of the pulse laser light based on a size of the target or related information related to the size of the target.