SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

Provided are a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition including the same. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:wherein R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group, etc., A1 and A2 each represent a hydrocarbon group, the group may have a substituent, -CH2- in the group may be replaced by -O-, -CO-, -S-, -SO2-, etc., X3 and X4 each represent -O- or -S-, m1 present an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4 and m5 represent an integer of 0 to 3, m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, and AI− represents an organic anion.