ACTIVE MATRIX SUBSTRATE AND DISPLAY DEVICE

An active matrix substrate includes a substrate in which a notch or an aperture is formed, and electrodes. Each electrode includes at least either of: a capacitor forming portion that is arranged in a region other than a bypass region and overlaps with at least one of a plurality of bypass gate line...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	HORIUCHI, Satoshi, YOSHINO, Hikaru, MORINAGA, Junichi
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS DEVICES OR ARRANGEMENTS, THE OPTICAL OPERATION OF WHICH ISMODIFIED BY CHANGING THE OPTICAL PROPERTIES OF THE MEDIUM OF THEDEVICES OR ARRANGEMENTS FOR THE CONTROL OF THE INTENSITY,COLOUR, PHASE, POLARISATION OR DIRECTION OF LIGHT, e.g.SWITCHING, GATING, MODULATING OR DEMODULATING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FREQUENCY-CHANGING NON-LINEAR OPTICS OPTICAL ANALOGUE/DIGITAL CONVERTERS OPTICAL LOGIC ELEMENTS OPTICS PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES OR PROCEDURES FOR THE OPERATION THEREOF
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Beschreibung
Zusammenfassung:	An active matrix substrate includes a substrate in which a notch or an aperture is formed, and electrodes. Each electrode includes at least either of: a capacitor forming portion that is arranged in a region other than a bypass region and overlaps with at least one of a plurality of bypass gate lines when viewed in a plan view; and an electrode layer portion that is formed in an electrode layer and that composes a bypass gate line interposed portion together with a source line layer portion formed in a source line layer in the bypass region. The electrode layer portion and the source line layer portion overlap with at least one of the bypass gate lines in the bypass region when viewed in a plan view, and at least one of the bypass gate lines is positioned between the electrode layer portion and the source line layer portion in a normal line direction of the substrate.