METHOD OF INSPECTING A WAFER AND APPARATUS FOR PERFORMING THE SAME

A method of inspecting a wafer comprising measuring an intensity of an incident light and storing the measurement as stored incident light intensity, irradiating the incident light to the wafer, measuring an intensity of a reflected light from the wafer and storing the measurement as stored reflecte...

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Hauptverfasser:	Hwang, Eunsoo, Hong, Kijoo, Park, Youngkyu, Oh, Juntaek, Ahn, Jinwoo
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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creator	Hwang, Eunsoo Hong, Kijoo Park, Youngkyu Oh, Juntaek Ahn, Jinwoo
description	A method of inspecting a wafer comprising measuring an intensity of an incident light and storing the measurement as stored incident light intensity, irradiating the incident light to the wafer, measuring an intensity of a reflected light from the wafer and storing the measurement as stored reflected light intensity, and correcting the stored reflected light intensity based on a difference between the stored incident light intensity and a reference intensity of a reference incident light.
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Hong, Kijoo ; Park, Youngkyu ; Oh, Juntaek ; Ahn, Jinwoo</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US2023104399A13</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES</topic><topic>MEASURING</topic><topic>PHYSICS</topic><topic>TESTING</topic><toplevel>online_resources</toplevel><creatorcontrib>Hwang, Eunsoo</creatorcontrib><creatorcontrib>Hong, Kijoo</creatorcontrib><creatorcontrib>Park, Youngkyu</creatorcontrib><creatorcontrib>Oh, Juntaek</creatorcontrib><creatorcontrib>Ahn, Jinwoo</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Hwang, Eunsoo</au><au>Hong, Kijoo</au><au>Park, Youngkyu</au><au>Oh, Juntaek</au><au>Ahn, Jinwoo</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>METHOD OF INSPECTING A WAFER AND APPARATUS FOR PERFORMING THE SAME</title><date>2023-04-06</date><risdate>2023</risdate><abstract>A method of inspecting a wafer comprising measuring an intensity of an incident light and storing the measurement as stored incident light intensity, irradiating the incident light to the wafer, measuring an intensity of a reflected light from the wafer and storing the measurement as stored reflected light intensity, and correcting the stored reflected light intensity based on a difference between the stored incident light intensity and a reference intensity of a reference incident light.</abstract><oa>free_for_read</oa></addata></record>
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subjects	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
title	METHOD OF INSPECTING A WAFER AND APPARATUS FOR PERFORMING THE SAME
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