SEMICONDUCTOR DEVICE

A semiconductor device includes a semiconductor substrate having a first main surface and a second main surface, a plurality of wirings which are layered over the first main surface in a thickness direction that is a direction extending from the second main surface to the first main surface, and a p...

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Bibliographische Detailangaben
1. Verfasser: FURUYA, Keiichi
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A semiconductor device includes a semiconductor substrate having a first main surface and a second main surface, a plurality of wirings which are layered over the first main surface in a thickness direction that is a direction extending from the second main surface to the first main surface, and a passivation film which covers a top wiring that is a wiring being at a farthest position from the first main surface in the thickness direction, of the plurality of wirings. The top wiring has a first linear portion linearly extending along a first direction from a termination portion of the top wiring. The passivation film has a first dummy opening, the first dummy opening penetrating the passivation film in the thickness direction. The first dummy opening is disposed so as to overlap with an end portion of the first linear portion on the termination portion side, in plan view.