LITHO-LITHO-ETCH (LLE) MULTI COLOR RESIST

A method of forming a multi color resist structure includes providing a substrate including an underlayer material; forming a first organic planarizing layer on the substrate; forming a first anti reflecting layer on the first organic planarizing layer, forming and developing a first patterned resis...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: De Silva, Ekmini Anuja, Mignot, Yann, Goldfarb, Dario
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A method of forming a multi color resist structure includes providing a substrate including an underlayer material; forming a first organic planarizing layer on the substrate; forming a first anti reflecting layer on the first organic planarizing layer, forming and developing a first patterned resist on the first anti reflecting layer; forming a second organic planarizing layer on the first anti reflecting layer and on the first patterned resist; forming a second anti reflecting layer on the second organic planarizing layer and forming and developing the second patterned resist, wherein the first patterned resist is a non-chemically amplified resist (n-CAR) or metal resist and the second patterned resist is CAR organic resist.