SEMICONDUCTOR DEVICE AND LAYOUT METHOD THEREFOR

A semiconductor device including first and second standard cells disposed in one of a first direction and a second direction intersecting the first direction, the first and second directions parallel to a substrate, and each of the first and second standard cells including a gate structure and an ac...

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Hauptverfasser: KIM, Minsu, KIM, Chunghee
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A semiconductor device including first and second standard cells disposed in one of a first direction and a second direction intersecting the first direction, the first and second directions parallel to a substrate, and each of the first and second standard cells including a gate structure and an active region, and a filler cell adjacent to the first standard cell in the second direction and adjacent to the second standard cell in the first direction, wherein an output node of the first standard cell is connected to an input node of the second standard cell, an output active contact providing an output node of the first standard cell is connected to a wiring active contact among at least one dummy active contact included in the filler cell, and an input wiring providing an input node of the second standard cell is connected to the wiring active contact may be provided.