APPARATUS FOR PROCESSING A SUBSTRATE AND METHOD OF OPERATING THE SAME

An apparatus for processing a substrate includes a reaction tube, a side cover, a heater, a first gas supplier, a second gas supplier and a controller. The reaction tube is configured to receive a substrate boat in which a plurality of the substrate is received to process the substrate. The side cov...

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Bibliographische Detailangaben
Hauptverfasser:	PARK, Song Hwan, JIN, Yong Tak, KIM, Bo Sun, KANG, Sung Ho, KIM, Tae Hwan, YOO, Hyun Jun, KANG, Min Woong, LEE, Hong Won, CHO, Joo Hyun, JUNG, Min Jin
Format:	Patent
Sprache:	eng
Schlagworte:	BLASTING FURNACES FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL HEATING KILNS LIGHTING MECHANICAL ENGINEERING OPEN SINTERING OR LIKE APPARATUS OVENS RETORTS WEAPONS
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Beschreibung
Zusammenfassung:	An apparatus for processing a substrate includes a reaction tube, a side cover, a heater, a first gas supplier, a second gas supplier and a controller. The reaction tube is configured to receive a substrate boat in which a plurality of the substrate is received to process the substrate. The side cover is configured to receive the reaction tube. The heater lines the interior of the side cover. The first gas supplier is provided to an upper portion of the side cover to supply a cooling gas at a first supplying rate to a space between the side cover and the reaction tube. The second gas supplier is provided to a lower portion of the side cover to supply the cooling gas at a second supplying rate different from the first supplying rate to the space between the side cover and the reaction tube. The controller controls the reaction tube.