WAFER PROCESSING APPARATUS INCLUDING EFEM AND METHOD OF PROCESSING WAFER

A wafer processing apparatus may include a plurality of equipment front end modules (EFEMs), a wafer transfer chamber, a wafer processing chamber, and a wafer transfer arm. Each of the plurality of EFEMs may include an EFEM chamber, a plurality of load ports provided at a side of the EFEM chamber, a...

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Bibliographische Detailangaben
Hauptverfasser: Choi, Jinhyuk, Hwang, Beomsoo, Lee, Kongwoo, Lee, Kyusang, Seo, Jonghwi, Kim, Keonwoo, Song, Myungki
Format: Patent
Sprache:eng
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Zusammenfassung:A wafer processing apparatus may include a plurality of equipment front end modules (EFEMs), a wafer transfer chamber, a wafer processing chamber, and a wafer transfer arm. Each of the plurality of EFEMs may include an EFEM chamber, a plurality of load ports provided at a side of the EFEM chamber, and a load lock provided at a side of the EFEM chamber to overlap with at least one of the plurality of load ports in a vertical direction.