SYSTEMS AND METHODS FOR TREATING A METAL SUBSTRATE

Disclosed is a system for treating a metal substrate comprising a conversion composition comprising trivalent chromium in an amount of 0.001 g/L to 20 g/L and a sealing composition comprising an ammonium-containing compound. Also disclosed is a method for treating a metal substrate that includes con...

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Bibliographische Detailangaben
Hauptverfasser:	Post, Gordon L, Ibrahim, Abdulrahman Dawoud, Martin, Justin J, Mayo, Michael A
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	Disclosed is a system for treating a metal substrate comprising a conversion composition comprising trivalent chromium in an amount of 0.001 g/L to 20 g/L and a sealing composition comprising an ammonium-containing compound. Also disclosed is a method for treating a metal substrate that includes contacting at least a portion of a surface of the substrate with the conversion composition and then contacting at least a portion of the surface of the substrate with the sealing composition. Also disclosed is a substrate obtainable by treatment with the system and/or obtainable by the method of treatment.