SUBSTRATE PROCESSING APPARATUS AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE

A substrate processing apparatus according to the embodiment includes: a substrate holding unit that holds a substrate; a rotation support unit that supports the substrate holding unit and rotates the substrate n a circumferential direction; a drive unit that drives the substrate holding unit with respect to the rotation support unit in a plane direction of the substrate; a detection unit that detects an outer edge portion of the substrate; a chemical liquid discharge unit that discharges a chemical liquid to the outer edge portion of the substrate; and a control unit that causes the drive unit to drive the substrate holding unit based on the outer edge portion detected by the detection unit in a manner that a center position in a plane of the substrate matches a rotation axis of the rotation support unit.