CLEANING DEVICES AND CLEANING METHODS

The present application relates to the field of semiconductors and discloses a cleaning device and a cleaning method. The cleaning device comprises a bearing mechanism for supporting an object to be cleaned in a preset direction, and a cleaning mechanism for cleaning the object to be cleaned, the cleaning mechanism comprising a base and a first cleaning member detachably disposed on the base. The first cleaning member comprises a housing for detachably connecting with the base and a first brush head portion disposed on the housing, an accommodating space being formed and surrounded by the housing and the first brush head portion. A second cleaning member is further disposed on the base, the second cleaning member being accommodated in the accommodating space.