DEPOSITION COMPOSITIONS AND METHODS OF MAKING AND USING SAME

A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf-S-Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and...

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Bibliographische Detailangaben
Hauptverfasser: Kehren, Jason M, Monteil, Alexandre R, Costello, Michael G, Lundberg, David J, Bulinski, Michael J, Qiu, Zai-Ming
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A deposition composition includes a solvent comprising a hydrofluorothioether compound represented by the following general formula (I): Rf-S-Rh where Rf is a fluorinated or perfluorinated group having 2-9 carbon atoms and optionally includes one or more catenated heteroatoms or chlorine atoms, and Rh is a non-fluorinated hydrocarbon group having 1-3 carbon atoms. The deposition composition further includes a coating material that is soluble or dispersible in said solvent.