FACTORY INTERFACE WITH REDUNDANCY

A substrate processing system for an electronic device manufacturing system can include a factory interface forming an interior volume, and a partition disposed in the factory interface. The partition can divide the interior volume into a first factory interface chamber forming a second interior vol...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Hudgens, Jeffrey C, Koshti, Sushant S, Reuter, Paul Benjamin, Ikeda, Kristen
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A substrate processing system for an electronic device manufacturing system can include a factory interface forming an interior volume, and a partition disposed in the factory interface. The partition can divide the interior volume into a first factory interface chamber forming a second interior volume, and a second factory interface chamber forming a third interior volume. The partition can be configured to provide a first sealed environment in the first factory interface chamber and a second sealed environment in the second factory interface chamber.