SEMICONDUCTOR STRUCTURE AND METHOD FOR FORMING THE SAME

A semiconductor structure includes a first dielectric layer on a substrate, a conductive structure disposed in the first dielectric layer and including a terminal portion and an extending portion connecting the terminal portion and extending away from the terminal portion, a second dielectric layer...

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Bibliographische Detailangaben
Hauptverfasser: Li, Kun-Ju, Shih, Yu-Lung, Chen, Jhih-Yuan, Gao, Wei-Xin, Chan, Ang, Liu, Hsin-Jung, Hou, Chau-Chung, Tsai, Fu-Shou, Chen, Chun-Han, Lin, Shih-Ming
Format: Patent
Sprache:eng
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Zusammenfassung:A semiconductor structure includes a first dielectric layer on a substrate, a conductive structure disposed in the first dielectric layer and including a terminal portion and an extending portion connecting the terminal portion and extending away from the terminal portion, a second dielectric layer disposed on the first dielectric layer, a conductive via through the second dielectric layer and directly contacting the extending portion, and a dummy via through the second dielectric layer and directly contacting the terminal portion. In a cross-sectional view, a width of the dummy via is smaller than 50% of a width of the conductive via.