PLASMA-RESISTANT GLASS AND MANUFACTURING METHOD THEREOF

The present invention relates to plasma-resistant glass containing 32-52 mol % of SiO2, 5-15 mol % of Al2O3, 30-35 mol % of CaO, and 0.1-15 mol % of CaF2 as chemical components, and a manufacturing method thereof. According to the present invention, a glass stability index KH is 2.0 or higher, and a...

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Bibliographische Detailangaben
Hauptverfasser:	LEE, Mun Ki, KIM, Dae Gean, SEOK, Hye Won, KIM, Hyeong Jun
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUSENAMELS CHEMISTRY GLASS JOINING GLASS TO GLASS OR OTHER MATERIALS MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES METALLURGY MINERAL OR SLAG WOOL SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS,MINERALS OR SLAGS SURFACE TREATMENT OF GLASS
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Beschreibung
Zusammenfassung:	The present invention relates to plasma-resistant glass containing 32-52 mol % of SiO2, 5-15 mol % of Al2O3, 30-35 mol % of CaO, and 0.1-15 mol % of CaF2 as chemical components, and a manufacturing method thereof. According to the present invention, a glass stability index KH is 2.0 or higher, and a plasma-resistant characteristic of an etch rate of lower than 10 nm/min for a mixed plasma of fluorine and argon (Ar) is exhibited.