DEVICE FOR DRYING SEMICONDUCTOR SUBSTRATES

A device is for drying disc-shaped substrates. The device has an elongated body, which tapers upwards to form a wedge having an angle α between two upper surfaces and an upper edge. The upper edge is configured to support a disc-shaped substrate. An upper surface of the two upper surfaces has a groo...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Rothenaicher, Simon, Geissler, Sebastian
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A device is for drying disc-shaped substrates. The device has an elongated body, which tapers upwards to form a wedge having an angle α between two upper surfaces and an upper edge. The upper edge is configured to support a disc-shaped substrate. An upper surface of the two upper surfaces has a groove having an increasing groove depth with increasing distance from the upper edge.